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DIN 50453-3:2001-04
Testing of materials for semiconductor technology - Determination of etch rates of etching mixtures - Part 3: Aluminium, gravimetric method
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Summary
Prüfung von Materialien für die Halbleitertechnologie - Bestimmung der Ätzrate von Ätzmischungen - Teil 3: Aluminium, Gravimetrisches Verfahren
Technical characteristics
| Publisher | Deutsche Institut für Normung e.V. (DIN) |
| Publication Date | 04/01/2001 |
| Page Count | 8 |
| EAN | --- |
| ISBN | --- |
| Weight (in grams) | --- |
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