DIN 50455-1:2008-04

Superseded Draft standard

Historical

DIN 50455-1:2008-04

Testing of materials for semiconductor technology - Methods for characterizing photoresists - Part 1: Determination of coating thickness with optical methods

Most recent standard

Description

Features

Life cycle

Historical

Summary

Prüfung von Materialien für die Halbleitertechnologie - Verfahren zur Charakterisierung von Fotolacken - Teil 1: Bestimmung der Schichtdicke mit optischen Messverfahren

Technical characteristics

Publisher	Deutsche Institut für Normung e.V. (DIN)
Publication Date	04/01/2008
Page Count	8
EAN	---
ISBN	---
Weight (in grams)	---

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Previous versions

DIN 50455-1:2009-10

DIN 50455-1:2009-10

Essai des matériaux pour la technologie des semiconducteurs - Méthodes de caractérisation des vernis pour photos - Partie 1: Détermination de l'épaisseur des couches par méthode optique

01/10/2009

Active

Most Recent

DIN 50455-1:2008-04

DIN 50455-1:2008-04

Testing of materials for semiconductor technology - Methods for characterizing photoresists - Part 1: Determination of coating thickness with optical methods

01/04/2008

Superseded

Historical

DIN 50455-1:1991-06

DIN 50455-1:1991-06

Testing of materials for semiconductor technology; methods for characterizing photoresists; determination of coating thickness with optical methods

01/06/1991

Superseded

Historical

Language

Format

Redline

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With Redline