ISO 14237:2010 (R2021)
Active , Reaffirmed Standard
Most Recent

ISO 14237:2010 (R2021)

Surface chemical analysis — Secondary-ion mass spectrometry — Determination of boron atomic concentration in silicon using uniformly doped materials

Summary

ISO 14237:2010 specifies a secondary-ion mass spectrometric method for the determination of boron atomic concentration in single-crystalline silicon using uniformly doped materials calibrated by a certified reference material implanted with boron. This method is applicable to uniformly doped boron in the concentration range from 1 x 1016 atoms/cm3 to 1 x 1020 atoms/cm3.

Notes

90.93 : Norme internationale confirmée

Technical characteristics

Publisher International Organization for Standardization (ISO)
Publication Date 07/09/2010
Confirmation Date 10/05/2021
Edition 2
Page Count 19
EAN ---
ISBN ---
Weight (in grams) ---
No products.

Previous versions

Contact us