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ISO 14606:2022

Surface chemical analysis — Sputter depth profiling — Optimization using layered systems as reference materials

Summary

This document gives guidance and requirements on the optimization of sputter-depth profiling parameters using appropriate single-layered and multilayered reference materials, in order to achieve optimum depth resolution as a function of instrument settings in Auger electron spectroscopy, X-ray photoelectron spectroscopy and secondary ion mass spectrometry. This document is not intended to cover the use of special multilayered systems such as delta doped layers.

Notes

60.60 : Norme internationale publiée

Technical characteristics

Publisher International Organization for Standardization (ISO)
Publication Date 11/21/2022
Edition 3
Page Count 17
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Weight (in grams) ---