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ISO 17331:2004 (R2019)
Surface chemical analysis — Chemical methods for the collection of elements from the surface of silicon-wafer working reference materials and their determination by total-reflection X-ray fluorescence (TXRF) spectroscopy
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Summary
ISO 17331:2004 specifies chemical methods for the collection of iron and/or nickel from the surface of silicon-wafer working reference materials by the vapour-phase decomposition method or the direct acid droplet decomposition method. It applies to iron and/or nickel atomic surface densities from 6 times 10 to the power 9 atoms per square centimetre to 5 times 10 to the power 11 atoms per square centimetre.
Notes
90.20 : Norme internationale en cours d'examen systématique
Technical characteristics
| Publisher | International Organization for Standardization (ISO) |
| Publication Date | 05/18/2004 |
| Confirmation Date | 10/15/2019 |
| Edition | 1 |
| Page Count | 18 |
| EAN | --- |
| ISBN | --- |
| Weight (in grams) | --- |
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