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ISO 21466:2019 (R2025)
Microbeam analysis — Scanning electron microscopy — Method for evaluating critical dimensions by CD-SEM
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Summary
This document specifies the structure model with related parameters, file format and fitting procedure for characterizing critical dimension (CD) values for wafer and photomask by imaging with a critical dimension scanning electron microscope (CD-SEM) by the model-based library (MBL) method. The method is applicable to linewidth determination for specimen, such as, gate on wafer, photomask, single isolated or dense line feature pattern down to size of 10 nm.
Notes
90.20 : Norme internationale en cours d'examen systématique
Technical characteristics
| Publisher | International Organization for Standardization (ISO) |
| Publication Date | 12/13/2019 |
| Confirmation Date | 07/17/2025 |
| Edition | 1 |
| Page Count | 47 |
| EAN | --- |
| ISBN | --- |
| Weight (in grams) | --- |
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