Active
Standard
Most Recent
ISO 23170:2022
Surface chemical analysis — Depth profiling — Non-destructive depth profiling of nanoscale heavy metal oxide thin films on Si substrates with medium energy ion scattering
Preview
Summary
This document specifies a method for the quantitative depth profiling of amorphous heavy metal oxide ultrathin films on Si substrates using medium energy ion scattering (MEIS).
Notes
60.60 : Norme internationale publiée
Technical characteristics
| Publisher | International Organization for Standardization (ISO) |
| Publication Date | 06/15/2022 |
| Edition | 1 |
| Page Count | 29 |
| EAN | --- |
| ISBN | --- |
| Weight (in grams) | --- |
No products.