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ISO/FDIS 19383:2026
Atomic layer deposition — Chemical characteristics and related process specifications of atomic layer deposition precursors
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Summary
This document describes the chemical characteristics and related process specifications of the atomic layer deposition precursors, including assay content, metal purity, and anion content specification.
Notes
40.00 : DIS enregistré
Technical characteristics
| Publisher | International Organization for Standardization (ISO) |
| Publication Date | 02/11/2026 |
| Edition | 1 |
| Page Count | 13 |
| EAN | --- |
| ISBN | --- |
| Weight (in grams) | --- |
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