21/30433862 DC:2021
Active Draft standard
Most Recent

21/30433862 DC:2021

BS ISO 17109 AMD1. Surface chemical analysis. Depth profiling. Method for sputter rate determination in X-ray photoelectron spectroscopy, Auger electron spectroscopy and secondary-ion mass spectrometry sputter depth profiling using single and multi-layer thin films
Most recent standard

Summary

Calibration;Depth;Thin films;Surfaces;Spectroscopy;X-ray photoelectron spectroscopy;Measurement;Photoelectron spectroscopy;Films (states of matter);Auger electron spectroscopy;Chemical analysis and testing;Ions;Analysis

Technical characteristics

Publisher British Standards Institution (BSI)
Publication Date 04/28/2021
Page Count 22
EAN ---
ISBN ---
Weight (in grams) ---

Replaces

Previous versions

Contact us