BS ISO 17109:2022
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BS ISO 17109:2022

Surface chemical analysis. Depth profiling. Method for sputter rate determination in X-ray photoelectron spectroscopy, Auger electron spectroscopy and secondary-ion mass spectrometry sputter dept profiling using single and multi-layer thin films

Summary

Calibration;Depth;Thin films;Surfaces;Spectroscopy;X-ray photoelectron spectroscopy;Measurement;Photoelectron spectroscopy;Films (states of matter);Auger electron spectroscopy;Chemical analysis and testing;Ions;Analysis

Technical characteristics

Publisher British Standards Institution (BSI)
Publication Date 03/31/2022
Page Count 32
Themes Analysis
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ISBN ---
Weight (in grams) ---

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