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DIN 50451-2:2003-04

Testing of materials for semiconductor technology - Determination of trace elements in liquids - Part 2: Calcium (Ca), cobalt (Co), chromium (Cr), copper (Cu), Iron (Fe), nickel (Ni) and zinc (Zn) in hydrofluoric acid with plasma-induced emission spectroscopy

Summary

The document specifies a method for testing hydrofluoric acid for the metal traces of cobalt (Co), chromium (Cr), copper (Cu), iron (Fe), and nickel (Ni) relevant to semiconductor technology. Emission spectroscopy with plasma excitation (for example, inductively coupled plasma (ICP) or direct current plasma (DCP)) is used for the determination. The range of application covers trace element mass fractions from 1 ng/g to 1000 ng/g.

Technical characteristics

Publisher Deutsche Institut für Normung e.V. (DIN)
Publication Date 04/01/2003
Page Count 8
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ISBN ---
Weight (in grams) ---
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