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DIN 50455-2:1999-11

Testing of materials for semiconductor technology - Methods for the characterisation photoresists - Part 2: Determination of photosensitivity of positive photoresists

Summary

The method according to the document covers the characterization of photoresists by comparison of the determined photosensitivity of a single-layer positive photoresist on silicon wafers with a reference photoresist.

Technical characteristics

Publisher Deutsche Institut für Normung e.V. (DIN)
Publication Date 11/01/1999
Page Count 4
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Weight (in grams) ---
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