Mask engineering; masks for integrated optics
€71.85
Mask engineering - Pattern
€51.99
Mask engineering - Pellicles
Standard Test Methods for Determining the Orientation of a Semiconductive Single Crystal (Withdrawn 2003)
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Test Method for Apparent Density of Ceramics for Electron Device and Semiconductor Application (Withdrawn 2001)
Standard Test Method for Measuring Radial Resistivity Variation on Silicon Wafers (Withdrawn 2003)
Standard Test Method for Thickness of Lightly Doped Silicon Epitaxial Layers on Heavily Doped Silicon Substrates Using an Infrared Dispersive Spectrophotometer (Withdrawn 2003)
Standard Test Method for Thickness of Epitaxial or Diffused Layers in Silicon by the Angle Lapping and Staining Technique (Withdrawn 2003)
Standard Test Method for Wavelength of Peak Photoluminescence and the Corresponding Composition of Gallium Arsenide Phosphide Wafers (Withdrawn 2008)
Standard Test Method for Thickness of Heteroepitaxial or Polysilicon Layers (Withdrawn 2002)
Standard Practice for Preparation of Samples of the Constant Composition Region of Epitaxial Gallium Arsenide Phosphide for Hall Effect Measurements (Withdrawn 2008)
Standard Test Method for Measuring Resistivity of Silicon Wafers Using a Spreading Resistance Probe (Withdrawn 2003)
Standard Test Method for Measurement of Insulator Thickness and Refractive Index on Silicon Substrates by Ellipsometry (Withdrawn 2003)
Standard Test Method for Measuring Warp and Total Thickness Variation on Silicon Wafers by Noncontact Scanning (Withdrawn 2003)
Standard Test Method for Measuring Flat Length on Wafers of Silicon and Other Electronic Materials (Withdrawn 2003)
