29.045 : Semiconducting materials

ASTM F1049-02

ASTM F1049-02

Withdrawn Most Recent

Standard Practice for Shallow Etch Pit Detection on Silicon Wafers (Withdrawn 2003

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ASTM F1393-02

ASTM F1393-02

Withdrawn Most Recent

Standard Test Method for Determining Net Carrier Density in Silicon Wafers by Miller Feedback Profiler Measurements With a Mercury Probe (Withdrawn 2003)

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ASTM F1725-02

ASTM F1725-02

Withdrawn Most Recent

Standard Guide for Analysis of Crystallographic Perfection of Silicon Ingots (Withdrawn 2003)

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ASTM F1726-02

ASTM F1726-02

Withdrawn Most Recent

Standard Guide for Analyis of Crystallographic Perfection of Silicon Wafers (Withdrawn 2003)

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ASTM F1727-02

ASTM F1727-02

Withdrawn Most Recent

Standard Practice for Detection of Oxidation Induced Defects in Polished Silicon Wafers (Withdrawn 2003)

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ASTM F1809-02

ASTM F1809-02

Withdrawn Most Recent

Standard Guide for Selection and Use of Etching Solutions to Delineate Structural Defects in Silicon (Withdrawn 2003)

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ASTM F673-02

ASTM F673-02

Withdrawn Most Recent

Standard Test Methods for Measuring Resistivity of Semiconductor Slices or Sheet Resistance of Semiconductor Films with a Noncontact Eddy-Current Gage (Withdrawn 2003)

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ASTM F1392-02

ASTM F1392-02

Withdrawn Most Recent

Standard Test Method for Determining Net Carrier Density Profiles in Silicon Wafers by Capacitance-Voltage Measurements With a Mercury Probe (Withdrawn 2003)

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ASTM F1390-02

ASTM F1390-02

Withdrawn Most Recent

Standard Test Method for Measuring Warp on Silicon Wafers by Automated Noncontact Scanning (Withdrawn 2003)

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ASTM F398-92(2002) (R1992)

ASTM F398-92(2002) (R1992)

Withdrawn Most Recent

Standard Test Method for Majority Carrier Concentration in Semiconductors by Measurement of Wavenumber or Wavelength of the Plasma Resonance Minimum (Withdrawn 2003)

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ASTM F1188-02

ASTM F1188-02

Withdrawn Most Recent

Standard Test Method for Interstitial Atomic Oxygen Content of Silicon by Infrared Absorption with Short Baseline (Withdrawn 2003)

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ASTM F1366-92(2002) (R1992)

ASTM F1366-92(2002) (R1992)

Withdrawn Most Recent

Standard Test Method for Measuring Oxygen Concentration in Heavily Doped Silicon Substrates by Secondary Ion Mass Spectrometry (Withdrawn 2003)

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ASTM F1530-02

ASTM F1530-02

Withdrawn Most Recent

Standard Test Method for Measuring Flatness, Thickness, and Thickness Variation on Silicon Wafers by Automated Noncontact Scanning (Withdrawn 2003)

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ASTM F1771-97(2002) (R1997)

ASTM F1771-97(2002) (R1997)

Withdrawn Most Recent

Standard Test Method for Evaluating Gate Oxide Integrity by Voltage Ramp Technique (Withdrawn 2003)

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ASTM F1810-97(2002) (R1997)

ASTM F1810-97(2002) (R1997)

Withdrawn Most Recent

Standard Test Method for Counting Preferentially Etched or Decorated Surface Defects in Silicon Wafers (Withdrawn 2003)

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