Gas analysis — Investigation and treatment of analytical bias
€183.00
Surface chemical analysis — Auger electron spectroscopy — Repeatability and constancy of intensity scale
€115.00
Surface chemical analysis — X-ray photoelectron spectroscopy — Procedures for determining backgrounds
€77.00
Surface chemical analysis — Secondary-ion mass spectrometry — Method for depth calibration for silicon using multiple delta-layer reference materials
€155.00
Surface chemical analysis — Secondary-ion mass spectrometry — Repeatability and constancy of the relative-intensity scale in static secondary-ion mass spectrometry
Surface chemical analysis — Handling of specimens prior to analysis
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Surface chemical analysis — Scanning-probe microscopy — Definition and calibration of the lateral resolution of a near-field optical microscope
Surface chemical analysis — Data transfer format for scanning-probe microscopy
Surface chemical analysis — Secondary-ion mass spectrometry — Determination of boron atomic concentration in silicon using uniformly doped materials
Gas mixtures — Gravimetric preparation — Mastering correlations in composition
Surface chemical analysis — Auger electron spectroscopy — Reporting of methods used for charge control and charge correction
Surface chemical analysis — Scanning-probe microscopy — Measurement of drift rate
Surface chemical analysis — Glow discharge mass spectrometry (GD-MS) — Introduction to use
Surface chemical analysis — General procedures for quantitative compositional depth profiling by glow discharge optical emission spectrometry
Surface chemical analysis — Scanning-probe microscopy — Determination of cantilever normal spring constants
