Surface chemical analysis — Chemical methods for the collection of elements from the surface of silicon-wafer working reference materials and their determination by total-reflection X-ray fluorescence (TXRF) spectroscopy
€115.00
Surface chemical analysis — X-ray photoelectron spectroscopy — Reporting of methods used for charge control and charge correction
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Surface chemical analysis — Secondary-ion mass spectrometry — Method for estimating depth resolution parameters with multiple delta-layer reference materials
€51.00
Laboratory glassware — Test tubes
Surface chemical analysis — Information format for static secondary-ion mass spectrometry
€77.00
Surface chemical analysis — X-ray photoelectron and Auger electron spectrometers — Linearity of intensity scale
Surface chemical analysis — Depth profiling — Measurement of sputtering rate: mesh-replica method using a mechanical stylus profilometer
Gas analysis — Investigation and treatment of analytical bias
€183.00
Surface chemical analysis — Auger electron spectroscopy — Repeatability and constancy of intensity scale
Surface chemical analysis — X-ray photoelectron spectroscopy — Procedures for determining backgrounds
Surface chemical analysis — Secondary-ion mass spectrometry — Method for depth calibration for silicon using multiple delta-layer reference materials
€155.00
Surface chemical analysis — Secondary-ion mass spectrometry — Repeatability and constancy of the relative-intensity scale in static secondary-ion mass spectrometry
Microbeam analysis — Guidelines for orientation measurement using electron backscatter diffraction
Surface chemical analysis — Handling of specimens prior to analysis
Surface chemical analysis — Scanning-probe microscopy — Definition and calibration of the lateral resolution of a near-field optical microscope
