29.045 : Semiconducting materials

DIN 50451-3:2002-01

DIN 50451-3:2002-01

Superseded Historical

Testing of materials for semiconductor technology - Determination of traces of elements in liquids - Part 3: Aluminium (Al), cobalt (Co), copper (Cu), sodium (Na), nickel (Ni), and zinc (Zn) in nitric acid with ICP-MS

€41.78

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DIN 50440-1:1981-11

DIN 50440-1:1981-11

Superseded Historical

Testing of materials for semiconductor technology; measurement of recombination carrier lifetime in silicon single crystals by means of photo conductive decay method; measurement on bar-shaped specimens

€41.78

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DIN 50441-2:1982-04

DIN 50441-2:1982-04

Superseded Historical

Testing of materials for semiconductor technology; measurement of the geometric dimensions of semiconductor slices; testing of edge rounding

€34.30

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DIN 50433-3:1982-04

DIN 50433-3:1982-04

Withdrawn Most Recent

Testing of materials for semiconductor technology; determination of the orientation of single crystals by means of Laue back scattering

€48.79

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DIN 50438-2:1982-08

DIN 50438-2:1982-08

Withdrawn Most Recent

Testing of materials for semiconductor technology; determination of impurty content in silicon by infrared absorption; carbon

€41.78

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DIN 50439:1982-10

DIN 50439:1982-10

Withdrawn Most Recent

Testing of materials for semiconductor technology; determination of the dopant concentration profile of single crystalline semiconductor material by means of the capacitancevoltage method and mercury contact

€41.78

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DIN 50433-2:1976-12

DIN 50433-2:1976-12

Withdrawn Most Recent

Testing of semi-conducting inorganic materials; determining the orientation of single crystals by means of optical reflection figure

€24.39

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DIN 50433-1:1976-12

DIN 50433-1:1976-12

Withdrawn Most Recent

Testing of semi-conducting inorganic materials; determining the orientation of single crystals by means of X-ray diffraction

€24.39

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DIN 50436:1976-10

DIN 50436:1976-10

Withdrawn Most Recent

Testing of semi-conducting inorganic materials - Measurement of the metalurgic thickness of epitaxial layers of silicon by the stacking fault method

€24.39

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DIN 50437:1979-06

DIN 50437:1979-06

Withdrawn Most Recent

Testing of semi-conductive inorganic materials; measuring the thickness of silicon epitaxial layer thickness by infrared interference method

€34.30

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DIN 50440:1998-11

DIN 50440:1998-11

Withdrawn Most Recent

Testing of materials for semiconductor technology - Measurement of carrier lifetime in silicon single crystals - Recombination carrier lifetime at low injection by photoconductivity method

€48.79

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DIN 50441-2:1998-11

DIN 50441-2:1998-11

Withdrawn Most Recent

Testing of materials for semiconductor technology - Determination of the geometric dimensions of semiconductor wafers - Part 2: Testing of edge profile

€48.79

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DIN 50454-1:1991-11

DIN 50454-1:1991-11

Superseded Historical

Testing of materials for semiconductor technology; determination of the dislocations etch pits density in monocrystals of III-V-compound semiconductors; galliumarsenide

€34.30

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DIN 50445:1992-04

DIN 50445:1992-04

Withdrawn Most Recent

Testing of materials for semiconductor technology; contactless determination of the electrical resistivity of semiconductor slices with the eddy current method; homogeneously doped semiconductor wafers

€34.30

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DIN 50452-2:1991-03

DIN 50452-2:1991-03

Superseded Historical

Testing of materials for semiconductor technology; test method for particle analysis in liquids; determination of particles with optical particle counters

€34.30

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